Precision Polysilicon Resistor Process,申请号KR20067004184-传众专利搜索

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发明名称	Precision Polysilicon Resistor Process
摘要
申请公布号	KR100800358(B1)	申请公布日期	2008.02.04
申请号	KR20067004184	申请日期	2006.02.28
申请人		发明人
分类号	H01L21/20;H01L;H01L21/02;H01L21/265;H01L21/302;H01L21/461;H01L27/08	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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