发明名称 |
CLEANING METHOD OF TIGHTLY CLOSED SPACE AND TIGHTLY CLOSED SPACE WITH CLEANING FUNCTION |
摘要 |
<p>PROBLEM TO BE SOLVED: To effectively capture and remove a gaseous contaminant with particulates by extending a freely workable effective area. SOLUTION: In a cleaning device for the tightly closed space using an ultraviolet ray source 2, a photoelectron emitting material 3 and/or a photocatalyst, a cleaning unit 3 integrated so as to surround the photoelectron emitting material 3 and/or the photocatalyst with the ultraviolet ray source 2 as the center is installed on the floor 14 of the tightly closed space or on the under part of the floor 14 through a parting plate. The cleaning unit 3 can be used in combination with the purification by an ion exchange fiber.</p> |
申请公布号 |
JPH11253835(A) |
申请公布日期 |
1999.09.21 |
申请号 |
JP19980294714 |
申请日期 |
1998.10.02 |
申请人 |
EBARA CORP |
发明人 |
FUJII TOSHIAKI;KAWAGUCHI MITSUO;SUZUKI TSUKURU;TANAKA YASUO;AOKI MASANORI |
分类号 |
B03C3/02;B01J35/02;B03C3/38;B03C3/82;H01L21/02;(IPC1-7):B03C3/38 |
主分类号 |
B03C3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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