发明名称 |
UV/halogen metals removal process |
摘要 |
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.
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申请公布号 |
US5954884(A) |
申请公布日期 |
1999.09.21 |
申请号 |
US19970818890 |
申请日期 |
1997.03.17 |
申请人 |
FSI INTERNATIONAL INC.;MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
LAWING, ANDREW SCOTT;FAYFIELD, ROBERT T.;SAWIN, HERBERT H.;CHANG, JANE |
分类号 |
C23F4/00;H01L21/302;H01L21/304;H01L21/306;H01L21/3213;(IPC1-7):B08B3/12 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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