Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol,申请号SG19970003615-传众专利搜索

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发明名称	Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol
摘要
申请公布号	SG67425(A1)	申请公布日期	1999.09.21
申请号	SG19970003615	申请日期	1995.08.11
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	BHATT, ANILKUMAR C.;KSENAK, GARY, S.;PAPATHOMAS, KOSTAS, I.;SHURTLEFF, JAMES A.;WAGNER, JEROME, J.
分类号	G03F7/32;G03F7/42;(IPC1-7):B01D53/72;G03F7/30;B01D53/14	主分类号	G03F7/32
代理机构		代理人
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