发明名称 CVD method of depositing a plurality of polycrystalline diamond film layers
摘要 A CVD method of forming a diamond coated article is disclosed, which consists essentially of a substrate and a plurality of polycrystalline diamond film layers accumulatively coated thereon in a total thickness of at least 20 mu m, wherein each of the polycrystalline diamond film layers (i) has a thickness of 6 to 13 mu m, (ii) has an average crystallite size in the surface direction thereof of 3 to 7 mu m, (iii) has (111) oriented diamond crystallites exposed on the surface thereof, and (iv) satisfies the relationship: I(N)/I(D)<0.2, wherein I(D) represents an intensity of diamond Raman peak in counts/sec appearing around 1333 cm-1 and I(N) represents a maximum intensity among non-diamond Raman peaks appearing between 1200 cm-1 and 1600 cm-1.
申请公布号 US5955155(A) 申请公布日期 1999.09.21
申请号 US19980168385 申请日期 1998.10.08
申请人 NGK SPARK PLUG CO., LTD. 发明人 YAMAMOTO, HIROSHI;OKAMURA, TAKASHI;IIO, SATOSHI
分类号 B23B27/14;B32B9/00;C23C16/26;C23C16/27;C23C16/50;C23C16/511;C23C28/00;C23C30/00;C30B29/04;(IPC1-7):B05D3/06 主分类号 B23B27/14
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