| 摘要 |
PROBLEM TO BE SOLVED: To prevent infiltration of a rinse fluid used in the preceding process and left in a collection groove into slurry in the next process in a slurry circula tion supplying surface polishing device. SOLUTION: In this polishing device, a groove bottom 8a of a collection groove 8 for collecting spent abrasive material slurry and rinse fluid is formed in V shape, a discharge port 10 is provided in the lowest position of the groove bottom 8a, a collection pipe 16 of a slurry supply mechanism 5 and a collection pipe 31 of a rinse fluid discharge mechanism 7 are connected to the discharge port 10, and the collection pipe 31 of the rinse fluid discharge mechanism 7 is connected to a suction pump 30 for forcedly discharging a rinse fluid by suction. |
