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发明名称
Method of forming a unilateral graded-channel semiconductor device using a gate electrode disposable spacer
摘要
申请公布号
SG67359(A1)
申请公布日期
1999.09.21
申请号
SG19960010444
申请日期
1996.08.13
申请人
MOTOROLA, INC.
发明人
DOW, DIANN, M.;DAVIES, ROBERT, B.;WILD, ANDREAS, A.;ILDEREM VIDA
分类号
H01L21/336;H01L21/8234;H01L29/10;H01L29/78;(IPC1-7):H01L21/336;H01L21/823;H01L21/265
主分类号
H01L21/336
代理机构
代理人
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地址
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