发明名称 |
SIOX:SI SPUTTERING TARGETS AND METHOD OF MAKING AND USING SUCH TARGETS |
摘要 |
Silicon oxide and electrically conductive doped silicon materials are fused in a protective environment to yield a composite SiO2:Si material that exhibits the properties of SiO2, and yet is electrically conductive due to the presence of the Si. Such a composite material finds use as a target for DC and/or AC sputtering processes to produce conductive silicon oxide thin films for touch-screen applications and the like. |
申请公布号 |
KR20080041232(A) |
申请公布日期 |
2008.05.09 |
申请号 |
KR20087005339 |
申请日期 |
2006.08.11 |
申请人 |
WINTEK ELECTRO-OPTICS CORPORATION |
发明人 |
STEVENSON DAVID E.;ZHOU LI Q. |
分类号 |
C23C14/34;C23C14/14 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|