发明名称 SIOX:SI SPUTTERING TARGETS AND METHOD OF MAKING AND USING SUCH TARGETS
摘要 Silicon oxide and electrically conductive doped silicon materials are fused in a protective environment to yield a composite SiO2:Si material that exhibits the properties of SiO2, and yet is electrically conductive due to the presence of the Si. Such a composite material finds use as a target for DC and/or AC sputtering processes to produce conductive silicon oxide thin films for touch-screen applications and the like.
申请公布号 KR20080041232(A) 申请公布日期 2008.05.09
申请号 KR20087005339 申请日期 2006.08.11
申请人 WINTEK ELECTRO-OPTICS CORPORATION 发明人 STEVENSON DAVID E.;ZHOU LI Q.
分类号 C23C14/34;C23C14/14 主分类号 C23C14/34
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