发明名称 |
Vorrichtung für eine thermische Behandlung von Substraten |
摘要 |
The invention relates to a device for the thermal treatment of substrates, comprising a reaction chamber, at least one heat source and at least one reflection wall for reflecting at least part of the radiation radiated by the heat source. The reflection wall is contoured to ensure a more even distribution of the radiation.
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申请公布号 |
DE19905050(A1) |
申请公布日期 |
1999.09.16 |
申请号 |
DE19991005050 |
申请日期 |
1999.02.08 |
申请人 |
STEAG AST ELEKTRONIK GMBH |
发明人 |
BLERSCH, WERNER;WALK, HEINRICH |
分类号 |
H01L21/00;(IPC1-7):H01L21/324;F27B17/00;B01J19/08 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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