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发明名称
Photolithographisches Verfahren zur Herstellung von kreisförmigen Strukturen mit hoher Dichte
摘要
申请公布号
DE69511356(D1)
申请公布日期
1999.09.16
申请号
DE19956011356
申请日期
1995.10.12
申请人
COMMISSARIAT A L'ENERGIE ATOMIQUE, PARIS
发明人
CLERC, JEAN-FREDERIC;RANDET, DENIS
分类号
G03F7/26;G03F7/00;G03F7/20;H01J9/02;H01L21/027;(IPC1-7):G03F7/20
主分类号
G03F7/26
代理机构
代理人
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地址
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