METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH CHEMICAL-MECHANICAL POLISHING PROCESS FOR PLANARIZATION OF INTERLAYER INSULATION FILMS,申请号KR19950021039-传众专利搜索

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发明名称	METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH CHEMICAL-MECHANICAL POLISHING PROCESS FOR PLANARIZATION OF INTERLAYER INSULATION FILMS
摘要
申请公布号	KR100221347(B1)	申请公布日期	1999.09.15
申请号	KR19950021039	申请日期	1995.07.18
申请人	NIPPON ELECTRIC K.K.	发明人	MURASE, HIROSI
分类号	C23C16/50;B24B37/04;C23C16/511;H01L21/304;H01L21/306;H01L21/31;H01L21/3105;H01L21/3205;H01L21/321;H01L21/768;(IPC1-7):H01L21/31	主分类号	C23C16/50
代理机构		代理人
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