Spatial light modulator with improved light shield

摘要

A spatial light modulator (10) having a micromechanical active portion (12) encompassed by a light shield (14). The light shield (14) is fabricated upon a substrate (36) and has a plurality of openings (72, and 80) to permit underlying layers of photoresist (90, 92) to be undercut from beneath the light shield. Removal of the photoresist layers provides a sufficiently flat light shield, and eliminates the possibility that particles from the photoresist layer could migrate to beneath active micromirrors (30) of the spatial light modulator (12).