发明名称 POLISHING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a polishing material having excellent polishing property, wearing resistance and moldability and having a prolonged using life. SOLUTION: This polishing material is produced by comprising (a) a polyethylene having 0.05-3 g/10 min melt index (MFR2 ) at 190 deg.C under 2.16 Kg load and a ratio (MFR10 /MFR2 ) of a melt index MFR10 to the former melt index MFR2 of <=15, (b) a polyethylene having 1.5-3.5 dl/g intrinsic viscosity [η] in a decalin solvent at 135 deg.C and a ratio of (MFR10 /MFR2 ) of the melt index MFR10 to the melt index MFR2 of <=15, (c) a polyethylene having 0.05-3 g/10 min melt index (MFR2 ) and <=8 molecular weight distribution (Mw/Mn) by gel permeation chromatography or (d) a polyethylene having 1.5-3.5 dl/g intrinsic viscosity [η] in a decalin solvent at 135 deg.C and <=8 molecular weight distribution (Mw/Mn) by gel permeation chromatography as principal components to obtain the subject polishing material having excellent polishing property, wearing resistance and moldability and having a prolonged using life.
申请公布号 JPH11246679(A) 申请公布日期 1999.09.14
申请号 JP19980047952 申请日期 1998.02.27
申请人 AIWA RAITO:KK;MARUZEN POLYMER KK;MARUZEN PETROCHEM CO LTD 发明人 MIWA MINORU;TAKAHASHI TOSHIAKI;NAKANISHI MITSUNORI;IIZUKA TETSUYA
分类号 C08J5/14;C09K3/14;(IPC1-7):C08J5/14 主分类号 C08J5/14
代理机构 代理人
主权项
地址