| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition useful as a resist composition which has good resolution, focal depth and developing properties and excellent sensitivity, resist pattern profile and storage stability and a method for preparing quinone diazide sulfonate compounds which can realize this composition. SOLUTION: A method for preparing quinone diazide sulfonate compounds comprises reacting a hydroxy compound having a phenolic and alcoholic hydroxyl groups in a molecule, one to six benzene rings and a molecular weight of 1,000 or lower with 1,2-naphthoquinone diazido sulfonic acid chloride in the presence of a pyridine-based compound of the formula (wherein Ra , Rb and Ic are each independently H or alkyl). A radiation-sensitive resin composition contains (A) an alkali-soluble novolak resin and (B) a quinone diazide sulfonate compound obtained by the above preparation method. |
