发明名称 |
Re-flow and buffer system for immersion lithography. |
摘要 |
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal. |
申请公布号 |
NL1036596(A1) |
申请公布日期 |
2009.08.24 |
申请号 |
NL20091036596 |
申请日期 |
2009.02.18 |
申请人 |
ASML HOLDING N.V.;ASML NETHERLANDS B.V. |
发明人 |
HARRY SEWELL;ERIK THEODORUS MARIA BIJLAART;SJOERD NICOLAAS LAMBERTUS DONDERS;LOUIS JOHN MARKOYA;DIANE MCCAFFERTY;RALPH JOSEPH MEIJERS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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