发明名称 Dram with dummy word lines
摘要 A plurality of word lines are disposed on the surface of a semiconductor substrate in a first direction. Two dummy word lines are disposed outside of the outermost word line among the word lines. MISFETs are disposed in correspondence with the word lines and dummy word lines. MISFETs are regularly disposed in the first direction and in a second direction crossing the first direction. One storage region among the source and drain regions of each MISFET is formed with a storage contact hole. The storage regions are distributed only in an area inside of the outermost dummy word line among the dummy word lines. A capacitor is connected to the storage region at the bottom of each storage contact hole. Different voltages are applied to the dummy word lines and the bit regions disposed outside of the outermost dummy word line. A semiconductor device capable of suppressing a standby current error is provided.
申请公布号 US5953247(A) 申请公布日期 1999.09.14
申请号 US19980222175 申请日期 1998.12.29
申请人 FUJITSU LIMITED 发明人 KOJIMA, HIDEYUKI;UCHIDA, TOSHIYA
分类号 H01L27/10;G11C8/14;G11C11/4099;H01L21/8242;H01L27/108;(IPC1-7):G11C11/24 主分类号 H01L27/10
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