发明名称 |
Method for forming a stepper focus pattern through determination of overlay error |
摘要 |
The present invention discloses a method for forming a pattern for stepper focus which can be monitored by overlay measurements such that a focal plane can be advantageously and accurately determined without human reading errors that are normally observed in conventional methods. The method for forming a stepper focus pattern for determining a focus error can be carried out by using an inner box and an outer box alignment marks and determining the shift in the center point of the two boxes as the overlay error.
|
申请公布号 |
US5952132(A) |
申请公布日期 |
1999.09.14 |
申请号 |
US19970928569 |
申请日期 |
1997.09.12 |
申请人 |
TAIWAN SEMICONDUCTOR MFG. CO. |
发明人 |
KING, MINGCHU;CHEN, SHIH-SHIUNG |
分类号 |
G03F7/20;G03F7/207;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|