发明名称 Method for correcting imperfections on a surface
摘要 A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.
申请公布号 US5948468(A) 申请公布日期 1999.09.07
申请号 US19970850665 申请日期 1997.05.01
申请人 SANDIA CORPORATION 发明人 SWEATT, WILLIAM C.;WEED, JOHN W.
分类号 (IPC1-7):B32B35/00 主分类号 (IPC1-7):B32B35/00
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