发明名称 PHOTOSENSITIVE ELEMENT, ITS PRODUCTION, PRODUCTION OF PHOSPHOR PATTERN USING PHOTOSENSITIVE ELEMENT, PHOSPHOR PATTERN, AND BACK PLATE FOR PLASMA DISPLAY PANEL
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive element in which a phosphor pattern of high accuracy and uniform shape can be formed with good workability, to provide its producing method, a producing method of a phosphor pattern, and a back plate for a plasma display panel having the phosphor pattern. SOLUTION: This photosensitive element consists of a first supporting film 5, (A) a peelable embedded layer 6 on the film 5, (B) an intermediate layer 7 on the layer 6, and (C) a photosensitive resin compsn. layer (compsn. layer) 8 containing a phosphor on the layer 7. This photosensitive element is produced in the following process. A first element having (A) a peelable embedded layer 6 on a first supporting film 5 and further having (B) an intermediate layer 7 on the layer 6 is laminated on a second element having (C) a compsn. layer 8 on a second supporting film, with the (B) intermediate layer 7 and the (C) compsn. layer facing each other. Then the second supporting film is removed by peeling.
申请公布号 JPH11242327(A) 申请公布日期 1999.09.07
申请号 JP19980045378 申请日期 1998.02.26
申请人 HITACHI CHEM CO LTD 发明人 TAI SEIJI;SATO KAZUYA;TANAKA HIROYUKI;KIMURA NAOKI;HORIBE YOSHIYUKI;NOJIRI TAKESHI;SHIMAMURA MARIKO
分类号 G03F7/004;B32B7/02;C08F20/20;C09K11/08;H01J9/227;H01J11/22;H01J11/34;H01J11/36;H01J11/42;H01J17/04 主分类号 G03F7/004
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