发明名称 APPARATUS FOR CONTROLLING LASER GAS OF EXCIMER LASER SYSTEM
摘要 PROBLEM TO BE SOLVED: To enable a stable laser performance to be obtained by performing appropriate control on a laser gas by accurately estimating the deterioration of the laser gas. SOLUTION: An apparatus for controlling a laser gas performs laser oscillation in a laser chamber 2 filled with the laser gas to process specified products and controls the fill or exhaust of the laser gas as the laser gas deteriorates, and during stopping of the above oscillation for processing products, specified oscillation data is measured by performing oscillation under specified conditions to estimate the deterioration of the laser gas, and the fill or exhaust of the laser gas is performed on the basis of the oscillation data. When oscillation is required, an oscillation request signal RQ is transmitted to an upper control apparatus, and oscillation is performed, after an oscillation permission signal EN is received from an upper control apparatus. The repetition number for pulse oscillations, oscillation duty, oscillation wavelength, target of output energy or charged voltage, and other oscillation conditions are kept constant to perform the oscillation.
申请公布号 JPH11243242(A) 申请公布日期 1999.09.07
申请号 JP19980058790 申请日期 1998.02.24
申请人 KOMATSU LTD 发明人 ISHIHARA TAKANOBU;HISANAGA NAOTO
分类号 H01S3/036;H01S3/225;(IPC1-7):H01S3/036 主分类号 H01S3/036
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