| 摘要 |
PROBLEM TO BE SOLVED: To form a fine pattern without color irregularity on the resist surface by patterning the resist of each color in the order of shorter wavelength of the max. absorption in the visible ray region, or if the wavelength of the max. absorption is same, in the order of longer wavelength of the max. transmission. SOLUTION: A pattern forming process including steps of applying a color resist on a transparent substrate, drying by heating, exposing, developing and hardening by heating is repeated for each color resist. The colors of the color resists are three primary colors of red, green and blue. The max. absorption wavelength is normally 530 to 570 nm for red, 620 to 700 nm for green and 570 to 670 nm for blue. Color irregularity is apt to appear with the max. absorption wavelength nearer to the max. luminosity, namely, with the shorter wavelength of the max. absorption. Therefore, in this method, the color resist of each color is patterned in the order of shorter wavelength of the max. absorption in the visible ray region, or if the max. absorption wavelength is same, in the order of longer wavelength of the max. transmittance. |
