发明名称 X-ray analyzing apparatus and x-ray irradiation angle setting method
摘要 An X-ray analyzing apparatus includes an X-ray tube, a monochromator crystal for making an X-ray monochromic, a slit, a moving table for supporting a product to be tested such as a semiconductor wafer, a detector for detecting the intensity of the X-ray beam, a table controller for setting a three-dimensional position and an angle of the moving table, and another detector for detecting scattered X-rays or fluorescent X-rays from the test product. A slit is provided so as to be vertically movable between the test product and the detector and to define a pass position of the X-ray beam which enters the detector. Thus, an X-ray irradiation angle to the test product can be set quickly and at high precision.
申请公布号 US5949847(A) 申请公布日期 1999.09.07
申请号 US19970956646 申请日期 1997.10.23
申请人 TECHNOS INSTITUTE CO., LTD. 发明人 TERADA, SHINICHI;MASAKI, MIKIHISA
分类号 G01N23/207;G01N23/221;G01N23/223;G21K1/06;H01L21/66;(IPC1-7):G01N23/223 主分类号 G01N23/207
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