发明名称 |
System for in-line monitoring of photo processing in VLSI fabrication |
摘要 |
An integrated de-focus pattern provides an effective in-line monitor of de-focus and relative tilt for photo processing steps of integrated circuit wafers. The de-focus pattern is formed on an integrated circuit wafer in the vertical and horizontal spaces between integrated circuit chips. The de-focus pattern has a number of different test patterns at different heights above the wafer surface. De-focus patterns are placed across the entire wafer surface. The de-focus patterns are formed at the same time the features of the circuit chips are formed. The de-focus patterns can be analyzed optically or using a scanning electron microscope.
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申请公布号 |
US5949547(A) |
申请公布日期 |
1999.09.07 |
申请号 |
US19970803352 |
申请日期 |
1997.02.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
TSENG, HUAN-CHI;CHEN, CHIA-HSIANG;TSENG, HAN-LIANG |
分类号 |
G03F7/20;G03F7/207;H01L23/544;(IPC1-7):G01B11/14;G01J1/00;G01N21/86 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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