发明名称 VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition mask capable of forming a light-emitting layer having a uniform height with high accuracy and good reproducibility, and a method for manufacturing the same.SOLUTION: A vapor deposition pattern 6 consisting of many independent vapor deposition through-holes 5 is provided in a mask body 2. The vapor deposition through-hole 5 is formed by communicating a small hole part 5a positioned on the side of an evaporation source with a large hole part 5b positioned on the side of a substrate 30 to be vapor-deposited and formed in a shape larger than the opening shape of the small hole part 5a. Accordingly, since the vapor deposition through-hole 5 having an outwardly expanding shape toward the evaporation source can be received an organic material from the evaporation source at a wide angle, a light-emitting layer having a uniform height can be formed with high accuracy.SELECTED DRAWING: Figure 1
申请公布号 JP2016125097(A) 申请公布日期 2016.07.11
申请号 JP20140266887 申请日期 2014.12.27
申请人 HITACHI MAXELL LTD 发明人 KOBAYASHI YOSHIHIRO;TAMARU HIROHITO;NAKAJIMA TAKASHI
分类号 C23C14/24;C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/24
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