发明名称 FORMATION OF WATERMARK EMBROIDERY PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method for resultingly producing an embroidery of fine watermark pattern within the periphery of each watermark pattern formed on a base fabric by using fine threads inadequate to an embroidery work by any sewing machine. SOLUTION: This method comprises: applying embroidery patterns to a base fabric 1 of e.g. interknitted or interwoven cloth made of polyester-based fiber and cellulose-based fiber by using a needling thread 2 resulted from intertwisting a thin yarn of polyester-based fiber or polyamide-based fiber with a thick yarn of cellulose-based fiber, applying a printing glue onto the embroidery patterns so as to form e.g. desired line designs 1c or patterns along each outer periphery of the embroidery patterns, removing the cellulose-based fiber on the sections to which the base fabric 1 and needling thread 2 are applied by employing a heat treatment and cleaning treatment after a dehydration process, thus forming watermark patterns 1a on the base fabric 1 and fine watermark embroidery patterns 1b within the watermark patterns 1a, simultaneously.
申请公布号 JPH11241258(A) 申请公布日期 1999.09.07
申请号 JP19980060675 申请日期 1998.02.25
申请人 TANAKA SHISHU:KK;MUNAKATA KATSUO 发明人 TANAKA SHOJI;MUNAKATA KATSUO
分类号 D06M11/00;D02G3/02;D04C1/06;D05C17/00;D06M11/57;D06M11/84;D06M101/00;D06M101/02;D06M101/06;D06M101/16;D06M101/30;D06M101/32;D06M101/34;(IPC1-7):D04C1/06 主分类号 D06M11/00
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