| 摘要 |
A film of an etchant-resistant material which is soluble when exposed to electromagnetic radiation is formed on a substrate. A voltage is then applied to an electrode in proximity to the surface, the electrode having conductive regions conforming to the required pattern while the substrate is exposed to perpendicular electromagnetic radiation to remove the passivating layer from the desired areas. An Independent claim is also included for an etching tank comprising a vessel of etching fluid having a voltage source and containing an electrode as above. Preferred Features: The conductive regions of the electrode surface are also transparent to electromagnetic radiation, and are separated by nonconductive and non-transparent regions. The passivating film may be generated by a component of the etchant. The latter may contain a reagent that in concentrated solution is capable of etching isotropically in the absence of an electric field, but is used in low concentration with such a field whereby anisotropic etching occurs. |
