发明名称 Drying apparatus for a semiconductor component e.g. a wafer or a mask
摘要 A semiconductor component drying apparatus comprises an isopropyl alcohol evaporation tank (1) fitted with an insulated side heater (7) for maintaining a predetermined tank interior temperature. A semiconductor component drying apparatus has a tank (1) for introduction of the component (5) in a holder (4), a bottom heater (3) for evaporating isopropyl alcohol (2) present in the tank (1), a top cooler (10) for condensing isopropyl alcohol vapor, a mid-height heater (7) extending from below the holder to near the cooler (10) and covered by a heat insulator (8) for maintaining the tank interior at a predetermined temperature. An Independent claim is also included for a semiconductor component drying process employing the above apparatus.
申请公布号 DE19848265(A1) 申请公布日期 1999.09.02
申请号 DE1998148265 申请日期 1998.10.20
申请人 RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORP.;MITSUBISHI DENKI K.K. 发明人 KINOSHITA, TAKATOSHI
分类号 H01L21/304;H01L21/306;(IPC1-7):H01L21/302 主分类号 H01L21/304
代理机构 代理人
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