发明名称 MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
摘要 A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:;
申请公布号 US2016237306(A1) 申请公布日期 2016.08.18
申请号 US201514979634 申请日期 2015.12.28
申请人 SAMSUNG SDI CO., LTD. 发明人 Choi Yoo-Jeong;Kim Yun-Jun;Park Yu-Shin;Park You-Jung;Song Hyun-Ji
分类号 C09D165/02;H01L21/311;C07D311/58;H01L21/027;C07D215/14;C07C39/225 主分类号 C09D165/02
代理机构 代理人
主权项 1. A monomer represented by Chemical Formula 1: wherein, in Chemical Formula 1, X is a substituted or unsubstituted aromatic ring group, A, B, and C are each independently a group represented by Chemical Formula 2, k, m, and n are independently 0 or 1, a sum of k, m, and n being 2 or 3, when k=m=1, A and B are different groups from each other, when k=n=1, A and C are different groups from each other, and when m=n=1, B and C are different groups from each other, and when k=m=n=1, at least two of A, B, and C are different groups from each other, wherein, in Chemical Formula 2, D and E are each independently a substituted or unsubstituted aromatic ring group, a substituted or unsubstituted heteroaromatic ring group, or a combination thereof, Z4 and Z5 are each independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a halogen-containing group, or a combination thereof, w is 0 or 1, and * is a linking point.
地址 Yongin-si KR