| 摘要 |
The present invention relates to a thin film deposition apparatus. According to the present invention, a thin film deposition apparatus comprises: a chamber having an accommodating space therein; a substrate support unit provided in the accommodating space for a substrate to be mounted, and provided to be vertically moved; a mask support unit provided to be vertically moved while supporting a mask which adheres to an upper portion of the substrate; and a mask support unit height determination unit determining a descending height when the mask support unit descends, and maintaining a gap between the mask and the substrate support unit to be a predetermined distance when the mask support unit ascends. |
