发明名称 |
Exposure method and exposure apparatus |
摘要 |
<p>An exposure method and apparatus for exposing a resist with a pattern image of a mask having patterns being different with respect to contrast of image, wherein the position where an image of a pattern, of the patterns of the mask, having lower contrast of image is formed is exposed with an image of contrast higher than the lower contrast image, whereby contrast of exposure amount distribution related to the pattern of lower contrast is improved. <IMAGE></p> |
申请公布号 |
EP0939343(A1) |
申请公布日期 |
1999.09.01 |
申请号 |
EP19990301386 |
申请日期 |
1999.02.25 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KAWASHIMA, MIYOKO;IWASAKI, YUICHI;SUZUKI, AKIYOSHI;SUGITA, MITSURO;SAITOH, KENJI |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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