| 摘要 |
Provided are a system and method for saturating a gas with a vapor from a liquid chemical. The system includes: (a) a saturation vessel (106) connected to receive a liquid chemical (118,120) and a carrier gas (102); (b) a gas sparger in the saturation vessel for sparging the carrier gas into the liquid chemical; (c) means for maintaining the liquid chemical in the saturation vessel at a substantially constant level (148,150); (d) means for controlling the temperature (169,130,132,165) of the liquid chemical in the saturation vessel to a desired value, comprising (I) a system for cooling the liquid chemical (154), and (ii) a heater (130) inside the saturation vessel extending vertically in the liquid a distance at least half of the height of the liquid chemical level for heating the liquid chemical; and (e) means for controlling the pressure (170) of the saturated gas to a desired value. The invention also relates to novel methods and systems for controlled delivery of a vaporized liquid chemical. The invention has particular applicability to the semiconductor manufacturing industry. |
