发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of surely holding a substrate, even when the length of a recess which contributes to the holding of a substrate is short. SOLUTION: A substrate carrier robot assembled in a substrate processing apparatus is provided with a pair of holding rods. A side face of each rod is divided into five regions in the circumferential direction around the axis of the rod. In a part of these regions, a plurality of recesses 351C for holding a substrate and formed. In each of the recesses 351C, tapers are formed in the depthwise direction and in the longitudinal direction. The taper in the longitudinal direction is so formed that the width at a position P2 where the substrate is held is narrower that at a position P1 where the substrate is delivered. It is to be noted that the width of the recess at the position P1 is larger than the thickness of the substrate to be handled and that at the position P2 it is narrower than the thickness of the substrate.</p>
申请公布号 JPH11238782(A) 申请公布日期 1999.08.31
申请号 JP19980038965 申请日期 1998.02.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SHIBAO TAKUYA;OSAKI TOSHIYUKI
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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