| 摘要 |
PROBLEM TO BE SOLVED: To enable to preventing damages to a mask and to manufacture semiconductor devices having high reliability. SOLUTION: An X-ray exposure apparatus is provided with displacement measuring instruments 10a and 10b by which the position of a mask 3 on which patterns to be transferred are formed, and that of the surface on which the patterns to be transferred of the mask 3 are formed are measured, and a conductive wire 11, a charging device 12, and a control part 9 by which the position of the surface on which patterns to be transferred of the mask 3 are formed is controlled according to the information of the measured position. |
