| 摘要 |
Disclosed is a method for fabricating a piezoelectric/electrostrictive thick film, using photolithography. On a vibrating plate is formed a bottom electrode. Over the bottom electrode, a photoresist is coated, exposed to light and developed to form molds in fine patterns. Separately, a ceramic paste is prepared by mixing a ceramic oxide powder and a ceramic sol solution. The ceramic oxide powder has a particle size of 5 mum or less and is prepared from Pb and Ti-based ceramic oxide powder by a non-explosive oxidation-reduction combustion reaction at 100-500° C. while the ceramic sol solution, identical or similar in composition to the ceramic oxide powder, uses water or an organic solvent as an base. Next, the ceramic paste is filled in the molds to form a piezoelectric/electrostrictive film, followed by conducting a thermal treatment at 100 to 300° C. to sinter the film. Finally, a top electrode is formed on the film. Alternatively, the bottom electrode may be not formed if the vibrating plate is of electroconductivity. In the micro actuator, a high aspect ratio of fine patterns and a significant improvement in the bonding properties between the film and the infrastructure are achieved. Also, the film is protected from external damage, such as scratching, because the molds surround the film. |
