发明名称 |
Low dielectric constant amorphous fluorinated carbon and method of preparation |
摘要 |
An amorphous fluorinated carbon film for use as a dielectric insulating layer in electrical devices is formed from a fluorinated cyclic hydrocarbon precursor. The precursor may be selected from the group consisting of hexafluorobenzene, 1,2-diethynyltetrafluorobenzene and 1,4-bis(trifluoromethyl) benzene. The film is deposited by a radiation or beam assisted deposition technique such as an ion beam assisted deposition method, a laser assisted deposition method, or a plasma assisted chemical vapor deposition method. The film is thermally stable in non-oxidizing environment at temperatures up to 400 DEG C. and has a low dielectric constant of less than 3.0. The film can be suitably used as an insulator for spacing apart conductors in an interconnect structure.
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申请公布号 |
US5942328(A) |
申请公布日期 |
1999.08.24 |
申请号 |
US19960608893 |
申请日期 |
1996.02.29 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GRILL, ALFRED;PATEL, VISHNUBHAI VITTHALBHAI |
分类号 |
C01B31/00;C07C22/08;C07C25/13;C23C14/06;C23C16/27;C23C16/50;H01B3/00;H01L21/312;H01L21/314;H01L21/768;H01L23/522;(IPC1-7):B32B9/00 |
主分类号 |
C01B31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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