发明名称 |
ELECTROPLATING DEVICE AND ELECTROPLATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-productivity electroplating device and a electroplating method by which the rear surface is hardly contaminated. SOLUTION: This device is provided with a plating tank 4 capable of being filled with a plating soln. M, a plating jig 1 for attachably/detachably holding the both of plates P to be plated in the state that these surfaces of a pair of the plates P to be plated are directed outward and the rear surfaces are opposed to each other in parallel at an interval and an anode 3 connectable to the anode of a power source 6 and arranged oppositely to the respective surfaces of the respective plates P to be plated. The plating jig 1 is furnished with a couple of frames 10 arranged in parallel with each other at an interval and a guide 12 for attachably/detachably fixing the plate P to be plated respectively to these frames 10. |
申请公布号 |
JPH11229196(A) |
申请公布日期 |
1999.08.24 |
申请号 |
JP19980030223 |
申请日期 |
1998.02.12 |
申请人 |
MITSUBISHI SHINDOH CO LTD |
发明人 |
KANDA YUICHI;OTAKE SHIGENARI;SATO SHINEI;NATSUME KANGO |
分类号 |
C25D7/00;C25D17/08;H01L23/50;H05K3/18;(IPC1-7):C25D17/08 |
主分类号 |
C25D7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|