| 摘要 |
PROBLEM TO BE SOLVED: To enable a work fluid of polishing fluid, rinse fluid, etc., left on a work surface of a surface plate to be removed easily and automatically. SOLUTION: A suction water head 17 of a work fluid removing mechanism 6 set up in a surface polishing device is connected to a suction pump 22, the suction water head 17 is brought into contact with a work surface of a surface plate 2 after a work-finished workpiece is removed, the surface plate 2 is rotated, also while moving the suction water head 17 in the radial direction of the surface plate, a work fluid on the work surface is sucked by the suction pump 22. |
