| 摘要 |
PROBLEM TO BE SOLVED: To execute stable substrate transfer without the lowering in substrate transfer speed and to obtain the suppression of particle generation and a high maintenance characteristic by sepn. of coating application areas and transportation areas. SOLUTION: Substrate holding stages 3a, 3b are respectively put from horizontal positions of a respective angle postures into perpendicular postures of application postures by the respective rotational actions of swiveling means 4a, 4b. This state is the coating application reference positions which are the substrate treatment positions of coating applicators 2a, 2b as substrate treating apparatus. Namely, the position changing of the horizontal transportation postures and the perpendicular coating application positions of a substrate 7 is executed by the stage swiveling action by the swiveling means 4a, 4b and, therefore, the respective setting of the substrate 7 to the substrate holding stages 3a, 3b may be easily executed in the state of the horizontal postures. Since the substrate holding stages 3a, 3b are respectively set in the substrate treatment positions from the rear side of the coating applicators 2a, 2b and the substrate treatments are respectively executed on the front side thereof the efficient sepn. of the substrate treatment areas and the transport areas is made possible. |
