发明名称 Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
摘要 Apparatus for supporting a wafer in a semiconductor wafer processing system. The apparatus contains a pedestal assembly, a ring assembly circumscribing the pedestal and an insulator between the pedestal assembly and ring assembly. The insulator electrically isolates the pedestal assembly from the ring assembly thereby preventing unwanted power coupling through the ring assembly.
申请公布号 US5942042(A) 申请公布日期 1999.08.24
申请号 US19970862272 申请日期 1997.05.23
申请人 APPLIED MATERIALS, INC. 发明人 GOGH, JAMES VAN
分类号 C23C14/50;H01J37/20;H01J37/32;H01J37/34;H01L21/285;H01L21/67;H01L21/677;(IPC1-7):C23C16/00;H01L21/00 主分类号 C23C14/50
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