发明名称 |
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system |
摘要 |
Apparatus for supporting a wafer in a semiconductor wafer processing system. The apparatus contains a pedestal assembly, a ring assembly circumscribing the pedestal and an insulator between the pedestal assembly and ring assembly. The insulator electrically isolates the pedestal assembly from the ring assembly thereby preventing unwanted power coupling through the ring assembly.
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申请公布号 |
US5942042(A) |
申请公布日期 |
1999.08.24 |
申请号 |
US19970862272 |
申请日期 |
1997.05.23 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GOGH, JAMES VAN |
分类号 |
C23C14/50;H01J37/20;H01J37/32;H01J37/34;H01L21/285;H01L21/67;H01L21/677;(IPC1-7):C23C16/00;H01L21/00 |
主分类号 |
C23C14/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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