| 摘要 |
PURPOSE:To prevent diffusion of contamination and to easily and efficiently obtain the objective pellicle film by performing a peeling process of the pellicle film from a substrate in a steam atmosphere. CONSTITUTION:After a pellicle film formed on a substrate is adhered to a pellicle frame, the film is peeled from the substrate. This peeling process is performed in a steam atmosphere. Thereby, diffusion of contamination is decreased compared to a conventional peeling process performed in water. The steam atmosphere may contain air, nitrogen gas, oxygen gas or other gas. Pressure and temp. of the steam are not limited but it is preferable that the pressure is the atmospheric pressure and the temp is between room tap. and 100 deg.C considering to maintain a stable water vapor atmosphere and easy working conditions. |
