| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target uniform in erosion at the time of being subjected to sputtering over the whole body of the target and improved in the service life of the target. SOLUTION: This sputtering target is composed of two or more sintered compacts with different sintered density, in which the sintered compact relatively high in sintered density is arranged on the part relatively easy to be eroded. Moreover, in the surface to be sputtered, the sintered density of the part relatively easy to be eroded is made relatively high. |
