| 摘要 |
An exposure apparatus for transferring a pattern on a reticle (1), through a projection optical system (3), onto a wafer (4) having a photosensitive material coated thereon includes a vacuum heat insulation panel (100a, 100b, 100c, 100d) which is applied to at least a part of the structure of the exposure apparatus to improve temperature-control in the exposure apparatus. <IMAGE> |
