| 发明名称 |
PH ADJUSTED NONIONIC SURFACTANT-CONTAINING ALKALINE CLEANER COMPOSITION FOR CLEANING MICROELECTRONICS SUBSTRATES |
| 摘要 |
Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.
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| 申请公布号 |
CA2146036(C) |
申请公布日期 |
1999.08.17 |
| 申请号 |
CA19952146036 |
申请日期 |
1995.03.31 |
| 申请人 |
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发明人 |
DAILEY, GARY G.;ILARDI, JOSEPH M.;SCHWARTZKOPF, GEORGE |
| 分类号 |
C11D10/02;C11D1/66;C11D3/02;C11D3/30;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):C23G1/14;H01L21/64 |
主分类号 |
C11D10/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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