| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for processing substrates, capable of easily keeping cleanliness of substrates after a specified process. SOLUTION: A substrate conveyance robot installed in an apparatus for processing substrates is provided with a holding pole 35R for holding a substrate. The side of the holding pole 35R is divided into five areas AR1, AR2, AR3, AR4, and AR5 in the direction of the circumference centering on the axis of the holding pole 35R. Among these areas, a substrate to be processed, a substrate being processed to which cleaning liquid is adhered, and a processed substrate which have been subject to a cleaning process and a drying process are held by the area AR4 for holding a substrate to be processed, the area AR3 for holding a substrate being processed, and the area AR5 for holding a processed substrate, respectively. Then grooves 35X are formed on both sides of the area AR3, which protects a droplet LG of the cleaning liquid which adheres to the area AR3 so as to prevent it from flowing out to the adjacent areas. |
