Aberration estimation reticle for determining overlay error

摘要

An aberration estimation reticle is provided with a plurality of units spaced from each other. The unit is provided with a first determination mark having a square planar configuration, and a second determination mark located in the first determination mark and including a plurality of holes arranged along a square. These structures provide an overlay error determination reticle and a method of determining an overlay error with the reticle taking an influence by aberration into consideration.