| 摘要 |
PROBLEM TO BE SOLVED: To enable glass material to deteriorate less in quality and to be improved in optical performance, by a method wherein a pulse light source and the component elements of a projection optical system are properly set using formulas I and II when a pattern on a mask is projected onto an exposure substrate through the projection optical system for exposure. SOLUTION: A pattern on a mask is illuminated with light pulses emitted from a light source through an illumination system and projected onto a square region on a substrate through a projection optical system for exposure in a projection exposure system. Provided that the pulse width of the light pulses, a distance between the final plane of the projection optical system and the surface of the substrate, the refractive index change coefficient, saturation coefficient, and allowable relative refractive index change of glass of a final optical member of the projection optical system, the number of irradiation pulses, energy density per pulse on a picture image, the lengths of two sides of the square region, the numerical aperture of the projection optical system, and a coherent factor determined resting on illuminating conditions are represented byτ, D,β,γ,Δn'max , I0 , L1 , L2 (where L1 <=L2 ), A, andσrespectively, component elements are properly set so as to satisfy formulas I and II.
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