| 发明名称 |
Drip catching apparatus for receiving excess photoresist developer solution |
| 摘要 |
A drip catching apparatus includes a trough 2 formed by a sidewall 26 and a drip catching surface 28 to prevent excess drops of a photoresist developer solution from dripping onto a semiconductor wafer 8 in a photoresist development cup 4. One or more holes 30 may be provided to drain the photoresist developer solution received by the drip trough 2.
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| 申请公布号 |
US5940651(A) |
申请公布日期 |
1999.08.17 |
| 申请号 |
US19980023853 |
申请日期 |
1998.02.13 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PIKE, CHRISTOPHER LEE;STEELE, DAVID ASHBY |
| 分类号 |
B05C11/08;B05C11/10;G03F7/30;H01L21/00;(IPC1-7):G03D5/00 |
主分类号 |
B05C11/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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