| 摘要 |
A predominantly liquid filled, vapor-liquid chemical reactor (10) having an improved distributor plate assembly is disclosed. At least one of the plates (18, 20) in the assembly is formed with an active area having a plurality of apertures (22) formed through the plate, an opening (26), and a downwardly depending lip (24) proximate the opening (26). As vapor ascends through the reactor, the plate (18) and the lip (24) cooperate to trap the vapor upwardly against the bottom of the plate, forming a vapor region. This vapor region facilitates vapor liquid interaction and the flow pattern of liquid through the reactor.
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