Coating substrate with polycrystalline semiconductor in production of active drive matrix for an LCD

摘要

A polycrystalline semiconductor coating is deposited by nucleation layer production followed by gas phase deposition of the semiconductor material. A substrate is coated with a polycrystalline semiconductor using the electric field of a plasma, containing ionized semiconductor material and/or compounds, to accelerate ions towards the substrate surface to produce a nucleation layer and subsequently depositing the semiconductor material from the gas phase. An Independent claim is also included for a similar process in which a discontinuous layer of insular material conglomerates is applied as the nucleation layer.