发明名称 METHOD OF PRODUCING SILICON SINGLE CRYSTAL AND SINGLE CRYSTAL SILICON WAFER
摘要 A method of producing a silicon single crystal grown by the Czochralski method, wherein a crystal with a predetermined length is pulled up while the average pulling speed is changed a plurality of times, the relationship between the average pulling speed of each pulling length and the OSF ring diameter is found, an average pulling speed pattern for producing/vanishing OSF rings at desired positions according to the results of the relationship, and a crystal is grown in accordance with the average pulling speed pattern.
申请公布号 WO9940243(A1) 申请公布日期 1999.08.12
申请号 WO1999JP00431 申请日期 1999.02.02
申请人 SUMITOMO METAL INDUSTRIES, LTD.;NISHIKAWA, HIDESHI 发明人 NISHIKAWA, HIDESHI
分类号 C30B15/00;(IPC1-7):C30B15/20;C30B29/06 主分类号 C30B15/00
代理机构 代理人
主权项
地址