发明名称 |
METHOD OF PRODUCING SILICON SINGLE CRYSTAL AND SINGLE CRYSTAL SILICON WAFER |
摘要 |
A method of producing a silicon single crystal grown by the Czochralski method, wherein a crystal with a predetermined length is pulled up while the average pulling speed is changed a plurality of times, the relationship between the average pulling speed of each pulling length and the OSF ring diameter is found, an average pulling speed pattern for producing/vanishing OSF rings at desired positions according to the results of the relationship, and a crystal is grown in accordance with the average pulling speed pattern.
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申请公布号 |
WO9940243(A1) |
申请公布日期 |
1999.08.12 |
申请号 |
WO1999JP00431 |
申请日期 |
1999.02.02 |
申请人 |
SUMITOMO METAL INDUSTRIES, LTD.;NISHIKAWA, HIDESHI |
发明人 |
NISHIKAWA, HIDESHI |
分类号 |
C30B15/00;(IPC1-7):C30B15/20;C30B29/06 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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